| 摘要 |
<p>This invention relates to gas treatment apparatus and methods and particularly, but not exclusively, to such apparatus and methods for use with exhaust products form semi-conductor manufacturing process. A reactor column (10) has an inlet (11) at the bottom and an outlet (12). Between the inlet and outlet it is divided into three sequential stages containing: silicon or silicon containing materials; lime or soda lime and copper oxide or copper oxide reagents.</p> |
