发明名称 MASTER HOLOGRAM AND MICROPATTERN REPLICATION METHOD
摘要 <p>A hologram is directly recorded in a sensitized metal substrate (1). The hologram may be an amplitude hologram, or may be treated to produce a phase relief hologram which may be stamped into a plastic material for reproduction, be archivally stored, or used as a master for electroforming a second durable surface relief hologram for use as an embossing master. A suitable material is prepared from a polished silver plate exposed to halogen vapors. After exposure (2), the plate is developed (3) and fixed, and the surface is differentially etched to form a surface relief suitable for hologram embossing. Daguerreotype processes are modified to make surface amplitude holograms and phase holograms. By etching through a metal film a semiconductor mask is obtained. By depositing a silver film directly on a wafer, masks are made with very high feature definition.</p>
申请公布号 WO1989012261(A1) 申请公布日期 1989.12.14
申请号 US1989002425 申请日期 1989.06.02
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