首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
HEAT TREATMENT FURNACE FOR SEMICONDUCTOR WAFER
摘要
申请公布号
JPH01305514(A)
申请公布日期
1989.12.08
申请号
JP19880137723
申请日期
1988.06.03
申请人
NEC CORP
发明人
NATORI HIROYUKI
分类号
H01L21/22
主分类号
H01L21/22
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Compactor apparatus suitable for use in waste collection apparatus
COMPOSITE DENTAL CEMENT COMPOSITION CONTAINING A LANTHANIDE SERIES COMPOUND.
Image processing.
Load indicating washer
Assay method
Bearing steel
IMPROVEMENTS IN OR RELATING TO DNA CLONING TECHNIQUES AND PRODUCTS FOR USE THEREWITH.
SOAP BAR COMPOSITION COMPRISING SILICONE.
SANITARY ARRANGEMENT FOR CATS (CAT TOILETS).
MILKING SYSTEM WITH VARIABLE PRESSURE SOURCE.
Fluorescent lamp for use in aquaria.
Image forming apparatus to provide multicolor images.
Horizontal deflection output stage for the picture tube of a display unit.
Rotary viscosimeter
Liquid anthelmintic selenium compositions
A coil-end supporting device and a rotary-machinery stator equipped with same
Electrically operated stop-cock for mains water supply
A processing method for white carbon
Car seat rising aid
SUBSTITUTED PYRIMIDINES AND THEIR USE AS PESTICIDES.
