| 摘要 |
PURPOSE:To manufacture a glass forming die having high durability, excellent in releasing property, and providing a superior pressed product similar to die surface by forming a thin film consisting of a mixture of diamond crystals, graphite crystals, etc., on the die surface of a base material by a plasma (or thermal) CVD method. CONSTITUTION:A base material 12 for glass forming die, such as SiC sintered compact, worked into a shape corresponding to the shape of a glass formed body to be produced is placed on a holder 7 in a plasma CVD apparatus. After evacuation, a gaseous mixture which contains organic gas, such as methane, and hydrogen gas and in which the concentration of the organic gas is regulated to >=30mole% is introduced into a reaction chamber 3. Then, microwaves are introduced via a waveguide 5 into the reaction chamber 3 and plasma is pro duced, by which a thin film of <=200Angstrom maximum surface roughness consisting of a mixture of diamond microcrystals, graphite microcrystals, and amorphous carbon can be formed on the base material 12. By this method, the glass forming die can be manufactured. |
