METHOD AND APPARATUS FOR DEPOSITING COATINGS IN A GLOW DISCHARGE

摘要

A method and apparatus for coating substrates by glow discharge in which the generation of ions and deposition of a coating are controlled independently. A plasma is established inside a chamber by application of either RF or DC voltages to a cathode, e.g., an aluminium cathode. Above the cathode a substrate is held on a substrate holder whose temperature can be controlled independently of the plasma temperature. An electrical bias may be applied to the substrate. Ions in the plasma strike the cathode and a number leave the cathode to strike the substrate and form the required coating. The coating may be hard carbon from a hydro-carbon gas e.g. butane, or silicon from silane gas, or germanium from germane gas. The substrate may be electrically conducting or insulating.