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发明名称
Verfahren zur Herstellung einer dotierten Schicht an der Oberfläche eines Halbleiterkristalls
摘要
申请公布号
CH440230(A)
申请公布日期
1967.07.31
申请号
CH19640016828
申请日期
1964.12.30
申请人
SIEMENS AKTIENGESELLSCHAFT
发明人
DR. PAMMER,ERICH,DIPL.-CHEM.
分类号
B01F3/02;C23C16/448;C30B25/02;C30B31/16;H01L21/00
主分类号
B01F3/02
代理机构
代理人
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地址
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