| 摘要 |
PURPOSE:To form a pattern in a good shape without decreasing a reflectance of a multilayer film reflecting mirror by making an X-ray exposure mask by a method wherein multilayer film reflecting mirror is formed on a substrate and then a reflection prevention film is formed according to a desired pattern on the multilayer film reflecting mirror. CONSTITUTION:A multilayer film reflecting mirror 2 is formed on a mask substrate 1 and then a reflection prevention film 4 is formed on the multilayer film reflecting mirror 2 according to a desired pattern 3, to make an X-ray exposure mask. For formation of the reflection prevention film 4 on the multilayer film reflecting mirror 2 according to a desired pattern, a resist coating process, a development process and a peeling process are required. However, the multilayer film reflecting mirror gets less damage in these processes compared with an etching process. What's more, a processing accuracy and a reliability can be remarkably increased since a circuit can be written by an EB lithographic equipment. |
