| 摘要 |
<p>An exposure apparatus for lithographically transferring a pattern of a mask onto a workpiece coated with a radiation sensitive material includes a first filter (203) made of the same material as of the substrate of the mask, a second filter (204; 205) formed by a base member made of the same materials as the mask substrate and being coated with a radiation sensitive material, illuminometer (206) for measuring illuminance of light passed through the first and second filters (at 201), respectively, and control device (304, 305, 307) for determining an exposure time for lithographic transfer of the pattern of the mask onto the wafer, on the basis of a difference between a measured value as measured through the first filter and a measured value as measured through the second filter.</p> |
