| 摘要 |
<p>PHOTOPATTERNABLE DIELECTRIC COMPOSITIONS AND METHODS FOR MAKING AND USING A photosensitive polyamide acid composition consisting essentially of chemically combined units of the formula where R is a tetravalent organic radical or a tetravalent organosiloxane-containing radical, R1 is a divalent organic radical or a divalent organosiloxane-containing radical, and A is a photoreactive acrylate, cinnamate or 2,3-diphenylcyclopro-penol ester containing radical.</p> |
