发明名称 |
TAPING METHOD AND APPARATUS FOR SEMICONDUCTOR WAFER |
摘要 |
The taping method and apparatus for preventing chip dispersion comprises the following of : locating the taping roller longer than the wafer at the upper site of the wafer and contacting the taping roller with the wafer by raising the wafer clinger and then rotating the axis of a part of taping roller palte supporting the taping roller. As the result, vapour generation is prevented by the shrinking force of vapour protected film formed on the taping roller.
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申请公布号 |
KR890004877(B1) |
申请公布日期 |
1989.11.30 |
申请号 |
KR19870007893 |
申请日期 |
1987.07.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
RYU GI-SOK |
分类号 |
H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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