Method for changing the image scale in X-ray lithography

摘要

The invention relates to a method for changing the image scale in X-ray lithography according to patent ... (Patent Application P 3639346.0). A further solution for the object, to be able to undertake changes in the image scale in synchrotron lithography, consists in that the mask (1) is deformed at least in the imaging part which is positioned in front of the region, to be structured, of the object (8). The method is suitable for use in X-ray lithography for changing the image scale.