TESTING OR MEARSURING DURING TREATMENT OF SEMI-CONDUCTOR DEVICE

摘要

This invention is related to the method and device examining wafer by microscope, esp. testing it continuously by bringing into focus only once. The method includes steps of ;(1) attaching wafer to wafer chuck in vacuum ; (2) testing it with moving horizontally by bringing into focus one time ; (3) giving a horizontal test continuously without adjusting focus, after 900 rotation of wafer chuck. Because the wafer chuck has a rotary vacuum chuck in the lower part, it can absorb wafer by vacuum through a vacuum pipe.