| 摘要 |
<p>A film of a high-temperature superconductor (HTSC) is applied to a substrate (20) by pulverizing a target (15) of a material of a predetermined composition, and said film is given a structure and an oxygen stoichiometry suitable for superconductivity by heat treatment. Pulverizing according to said invention consists in sputtering by means of a magnetron (10) where the substrate (20) forms with the target (15) an angle of 45° to 90°. The surface of the substrate (20) is preferably perpendicular to the target (15) and the magnetron is preferably a planar DC-magnetron (10). In said conditions, texturized high-temperature superconducting films can be produced on polycrystalline substrates, the c-axis orientation of the film produced being advantageous for conductivity.</p> |
