| 摘要 |
A two exposure process for producing photocured coatings, such as photoresists, in which a composition containing a photosensitive free radical reactive system and a photosensitive cationic cure epoxy system is exposed in a first stage to a first radiation which initiates reaction in one of said systems and is exposed in a second stage to a second radiation, of different wavelengths, to initiate reaction in the other system. A process for producing images of photocured coating is also disclosed. |
