| 摘要 |
An alignment method and a pattern forming method using the same, wherein a substrate onto which a complete pattern is to be transferred is held by a holder having formed thereon at least two alignment marks disposed in a predetermined positional relation with each other. Separate masks having relatively complementing pattern segments are used. Each of the masks is aligned with corresponding portion of the holder through an associated one of the alignment marks. As the result, the pattern segments transferred onto the substrate is aligned with each other and the continuity of the pattern is assured on the substrate. Also provided is an alignment mark forming method and a pattern forming method using the same, wherein the region on a substrate in which a continuous pattern is to be formed is divided into at least two sections and alignment marks for these sections are simultaneously formed on the substrate by means of one single mask, so that the segments of the pattern which are first to be transferred onto the sections of the substrate can be aligned with each other when they are transferred onto the substrate.
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