| 摘要 |
PURPOSE:To enable production of a thin-film superconductor having the same composition as that of a target and stabilized quality, by using one of electrodes in a plasma atmosphere as the target formed of a calcined superconductor compact and arranging vacuum deposition substrates in a crossing direction to the electrode surfaces. CONSTITUTION:An electrode 3 and an electrode 2 (target material) placed on a base (2a) are oppositely arranged in a hermetically sealed tank 1. A calcined compact of a superconductor, such as Y-Ba-Cu-O-based or Bi-Sr-Ca-Cu-O-based superconductor, is used as the target material. A holding unit 6 of a polygonal cylinder consisting of alumina ceramics, etc., is arranged so as to surround a space between a pair of the electrodes 2 and 3. Vacuum deposition substrates 4 consisting of MgO, etc., are arranged side by side and fixed on the inner wall of the holding unit 6. The interior of the tank 1 is then evacuated to introduce Ar gas, etc. A voltage is subsequently applied across the electrodes 2 and 3 to generate a plasma and start sputtering. Thereby, thin films are formed on the vacuum deposition substrates 4. The resultant films are then heat-treated in an oxidizing atmosphere to provide superconductor thin films.
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