发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To improve developability with an aq. alkaline developing soln. and printing resistance by specifying the acid value of a polyurethane resin and the structural units to be provided thereto. CONSTITUTION:The acid value of the polyurethane resin is specified to a 0.4-2.0meq/g range and at least one kind of the structural unit selected from the structural units (group A) expressed by the formulas I, II and at least one kind of the structural unit selected from the structural units (group B) expressed by the formulas III-VI are respectively provided in combination to said resin. In the formula I, II, R<1> denotes a hydrogen atom or methyl group; R<2>, R<3> may be respectively the same or different and denote an alkyl group of <=4C; l, m, n respectively denote 2-8 integer. The ratio of the structural unit selected from the group A and the structural unit selected from the group B is preferably 0.1-10 molar ratio. The developability with the aq. alkaline developing soln. and printing resistance are thereby improved.
申请公布号 JPH01293336(A) 申请公布日期 1989.11.27
申请号 JP19880123591 申请日期 1988.05.20
申请人 FUJI PHOTO FILM CO LTD 发明人 KAMIYA AKIHIKO
分类号 G03F7/016;G03F7/035;G03F7/038 主分类号 G03F7/016
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