| 发明名称 |
Process for producing patterns in dielectric layers formed by plasma enhanced chemical vapor deposition (PECVD). |
| 摘要 |
<p>A process for forming a dielectric patterned layer 46, 48, 50 of any desired geometry on a selected substrate 52 which includes vapor depositing selected reactants on said substrate only in areas thereon which are coextensive with the surface area of an adjacent metal electrode pattern 54, 56, 58.</p> |
| 申请公布号 |
EP0342806(A1) |
申请公布日期 |
1989.11.23 |
| 申请号 |
EP19890304189 |
申请日期 |
1989.04.26 |
| 申请人 |
HEWLETT-PACKARD COMPANY |
发明人 |
BHASKAR, ELDURKAR V.;LEBAN, MARZIO A.;ANGERSTEIN, MICHAEL D. |
| 分类号 |
C23C16/04;C23C16/505;C23C16/509;H01L21/31 |
主分类号 |
C23C16/04 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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