| 摘要 |
PURPOSE:To improve the resolution and the process stability of the title material, without injuring the sensitivity and the thermo-resisting property of the photoresist material by incorporating a 1,2-quinone diazide compd. composed of a specified compd. in the photoresist material. CONSTITUTION:The novel 1,2-quinone diazide compd. shown by formula I and an alkali soluble resin are incorporated in the photoresist. In the formula, A is 3-5 C alkylene group, Ra and Rb are the same or the different with each other, and are each H, OH, 1-4 C alkyl group or halogen atom, D is 1,2- naphthoquinone diazide-4-sulfonyl group, 1,2-naphthoquinone diazide-5-sulfonyl group or 1,2-benzoquinone diazide-4-sulfonyl group, (m) and (n) are each an integer of 0-5, (m+n)>=1. The positive type photoresist composition is obtd. by dissolving the alkali soluble resin and the 1,2-quinone diazide compd. in an appropriate solvent so as to be in an amount of 20-40pts.wt. based on a solid matter contd. in the photoresist composition. Thus, the excellent performances of the photoresist material such as the sensitivity, the resolution, the thermo-resisting property and a pattern shape of the photoresist, are obtd. |
