| 摘要 |
PURPOSE:To polish the surface of a large area work uniformly by arranging an elastic member at least in a part of a polishing surface plate to which the work is adhered. CONSTITUTION:Wax 2 is coated over a polishing surface plate 1 which is heated, whereupon a rubber sheet (elastic member) 3 is placed, and further thereover wax 4 is coated, and thereupon a base board 5 as work t be processed is placed. Upon cooling down to the room temp., the base board 5 is fixed to the polishing surface plate 1. This polishing surface plate 1 is inverted up and down, and the base board 5 is placed on a polishing plate 7 which is coated with polishing liquid 6, and the surface of the base board 5 is polished by slidingly rotating the surface plate 1 with this polishing plate 7. At this time, deformation of the base board 5 generated by the load at the time of adhesion, the deformation generated by different coefficients of thermal expansion between the base board 5 and surface plate 1 due to temp. change at the time of cooling, and the deformation caused by contraction of wax are suppressed by elastical deformation of the rubber sheet 3. Thus the surface of the base board 5 is polished uniformly. |
