| 摘要 |
PURPOSE:To make possible to realize the min. working line width of a printing image of 0.5 to 0.6mum by composing the photoresist composition of a mixture of a photosensitive agent which is subjected the esterification addition of a quinone diazide compd. to a sensitizer, and a novolak resin. CONSTITUTION:The photoresist composition is composed of the mixture of the photosensitive agent which is subjected the esterification addition of the quinone diazide compd. to the sensitizer composed of a monosaccharide, a polysaccharide or an oligosaccharide, and the novolak resin. And the monosaccharide constituting the photosensitive agent is composed of glucose, mannose or galactose. The drawing of the printing image having the min. pattern line width of 0.5 to 0.6mum makes possible by using the photoresist as mentioned above, and subjecting the photoresist to a reduction projection exposure, using an i-line as a light source, whereby a LSI can be manufactured with good efficiency. |
