发明名称 PROCEDE D'OBTENTION D'UN MOTIF NOTAMMENT EN MATERIAU FERROMAGNETIQUE AYANT DES FLANCS DE PENTE DIFFERENTE ET TETE MAGNETIQUE COMPORTANT UN TEL MOTIF
摘要 This process consists in depositing a photosensitive resin layer (6) on a ferromagnetic layer (4) resting on a ceramic base (2); in photolithoetching an opening (8) in this resin layer and in then polymerising this resin so that the flanks (8a) of the said opening are sloped; forming a two-layer mask (10a, 12a) on the resin layer partly masking the said opening and defining the shape of the pattern to be produced in the ferromagnetic layer; anisotropically etching the resin layer so as to remove the unmasked regions of this layer; removing the mask; anisotropically etching the ferromagnetic layer (4) whilst using the etched resin layer as etching mask (6a), and removing the remainder of the resin layer. …<IMAGE>…
申请公布号 FR2619457(B1) 申请公布日期 1989.11.17
申请号 FR19870011599 申请日期 1987.08.14
申请人 COMMISSARIAT A ENERGIE ATOMIQUE 发明人 HENRI SIBUET
分类号 G03F7/00;G03F7/26;G11B5/31;H01F41/34;(IPC1-7):G03F7/00;G11B5/187 主分类号 G03F7/00
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