| 摘要 |
PURPOSE:To make it possible to always perform highly precise alignment by forming a photosensitive layer in a wafer holding means. CONSTITUTION:A photosensitive layer 106 consisting of optomagnetic record material, photochromic material, etc., is formed in a wafer chuck 3 which absorbs and holds a wafer 4. Accordingly, an alignment mark of reticule is transferred on this photosensitive layer 106 through a photographing lense 5, and based on the positioning relation between the transferred alignment mark image and the alignment mark on the wafer 4, positioning between the reticule and the wafer 4 or each shot area of the wafer 4 can be performed. Hereby, without recourse to treatment process of the wafer 4, always highly precise positioning can be performed. |
