发明名称 METHOD AND APPARATUS FOR MEASURING THE THICKNESS OF A COATING ON A SUBSTRATE
摘要 <p>A method of measuring both the thickness of a coating (A, B) on a substrate (S) and the relative concentration of the elements of the coating consists of directing an incident beam of radiation (2) at a predetermined acute angle of incidence towards the surface of a material so that the major part of the beam of the incident radiation is stopped within the material, causing fluorescence of the material, selecting the energy of the incident beam such that the major part of the flux of the incoming beam is stopped within the material and locating radiation detectors (3) in such a position that only the emitted fluorescence beam or beams (4) is or are accepted. Apparatus for performing the method is also described.</p>
申请公布号 WO1989011095(A1) 申请公布日期 1989.11.16
申请号 GB1989000518 申请日期 1989.05.12
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