发明名称 PROCESS AND DEVICE FOR LAMBDA VALUE CONTROL
摘要 <p>In a process for lambda value control, not only is the actual lambda control value measured by means of a lambda sensor responsive to abrupt charges, in order to determine control deviations, but an averaged lambda value is used as an actual lambda measurement value and compared with a target lambda value. The target lambda value is predetermined on the basis of various operating parameters so that under all operating conditions it is equal to to the lambda value which ensures optimal conversion of all pollutants. When the actual lambda value deviates from the predetermined value, at least one control parameter for the two-point control is modified so as to obtain the desired value. This process and a device for implementing it thereby enable the characteristics of a two-point control to be adjusted under all operating conditions so as to obtain the desired average lambda value for optimal conversion of pollutants.</p>
申请公布号 WO1989011030(A1) 申请公布日期 1989.11.16
申请号 DE1989000292 申请日期 1989.05.10
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