| 摘要 |
PURPOSE:To improve the preserving stability, and to prevent the deterioration of the definition and the heat-resisting property, etc., of the title composition by incorporating a specified mixture as a quinone diazide compd. in the positive type photoresist composition contg. the quinone diazide compd. and an alkaline soluble resin. CONSTITUTION:The positive type photoresist composition contains a composite photosensitive component, and the component is composed of 1,2-naphthoquinone diazide-5-sulfonate of 2,3,4-trihydroxybenzophenone (photosensitive agent A) and said ester (photosensitive agent B) which is different from the photosensitive agent A. The photosensitive agent A is obtd. by esterification occurring between 2,3,4-trihydroxybenzophenone and 1,2-naphthoquinone diazide-5-sulfonic acid, and has the degree of esterification of >=95%. Thus, the preserving stability of the composition is improved, and the deterioration of the definition and the heat-resisting property of the composition is prevented. |
