SEMICONDUCTOR TESTING DEVICE

摘要

The test pattern for monitoring the variation of the critical dimension of each layer with eyes comprises a standard pattern formed on an underlayer of present layer, a standard line and an indicator line parallel to the standard line. The extended lines of the above lines are separated with the same space respectively. One line out of the above lines is on the standard line. Each of the indicator line on the extended line is separated from the first pattern to form the step-shaped second pattern placed on the present layer.