| 摘要 |
<p>A fluorocarbon resin passivation film is formed on a ceramic superconductor by applying either an ion plating method or a dual ion beam sputtering method, using a solid as a source material. In the ion plating method, evaporated tetrafluoroethylene, for example, is ionised and accelerated so as to attain an ion beam energy of 1 to 10 KeV by which a polytetrafluoroethylene film is formed on the ceramic superconductor, and in the dual ion beam sputtering method, a sputtered tetrafluoroethylene ion beam, for example, forms a polytetrafluoroethylene film on the ceramic superconductor, assisted by an argon ion beam, for example, having ion energy of 1 to 10 KeV.</p> |
