发明名称 PHOTOMASK
摘要 PURPOSE:To prevent trouble of mask carrying accompanied with the outside shape change of a pellicle face and the change of optical characteristics by partially removing an adhesive layer between a pellicle frame and a photomask. CONSTITUTION:A pellicle 12 is adhered to a pellicle frame 13, and this pellicle frame 13 is adhered and fixed to a photomask 11 with an adhesive layer 14 between them. A part 16 of the adhesive layer is removed. Since this part 16 of the adhesive layer is removed, there is air permeability in a closed part 15 surrounded with the photomask 11, the pellicle 12, the pellicle frame 13, and the adhesive layer 14, and the pellicle face is not vertically moved by the change of atmospheric pressure. Thus, trouble of mask carrying accompanied with the outside shape change of the pellicle face and the change of optical characteristics are prevented.
申请公布号 JPH01281452(A) 申请公布日期 1989.11.13
申请号 JP19880111036 申请日期 1988.05.07
申请人 SEIKO EPSON CORP 发明人 USHIYAMA FUMIAKI
分类号 G03F1/00;H01L21/027;H01L21/30 主分类号 G03F1/00
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