发明名称 FORMATION OF MAGNETOSTRICTIVE FILM AND SPUTTERING DEVICE FOR MAGNETOSTRICTIVE FILM FORMATION
摘要 PURPOSE:To efficiently form a magnetostrictive film on the outside peripheral surface of a rotating shaft with high productivity by inserting a rotating shaft into the position on the central axis inside a cylindrical target and fixing this rotating shaft to the position on the above central axis and then carrying out sputtering while applying an external magnetic field in a direction at a specific angle with respect to the axis of the rotating shaft. CONSTITUTION:A cylindrical target 2 composed of a material having magnetostrictive effects, such as Ni-Fe alloy, is disposed in a vacuum tank (not shown in figure) and connected to an electrode 1. A rotating shaft 5 as the object of coating is inserted into the position on the central axis of the above cylindrical target 2 and fixed to the above position. Further, an inclined and cylindrical magnetic device 4 consisting of a shield 3, a magnet 41, and a yoke 42 is disposed on the outside periphery of the cylindrical target 2. By this magnetic device 4, an external magnetic field is applied in a direction at an angle of 30-60 deg. with respect to the axis of the rotating shaft 5. The electrode 1 is electrified in the above state, by which sputtering is carried out. By this method, the adhesion of the sputter atoms emitted from the target 2 to the unnecessary part other than the rotating shaft is prevented, by which the magnetostrictive film can be formed at high film-forming velocity and also contamination inside the vacuum tank can be reduced.
申请公布号 JPH01279755(A) 申请公布日期 1989.11.10
申请号 JP19880107229 申请日期 1988.04.28
申请人 YASKAWA ELECTRIC MFG CO LTD 发明人 IKEDA MITSUAKI
分类号 C23C14/36;C23C14/34;C23C14/35;H01L41/22 主分类号 C23C14/36
代理机构 代理人
主权项
地址