METHOD AND APPARATUS FOR VAPOR GROWTH OF SEMICONDUCTOR LAYER,申请号JP19880110227-传众专利搜索

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发明名称	METHOD AND APPARATUS FOR VAPOR GROWTH OF SEMICONDUCTOR LAYER
摘要
申请公布号	JPH01280308(A)	申请公布日期	1989.11.10
申请号	JP19880110227	申请日期	1988.05.06
申请人	FUJITSU LTD	发明人	HOSHINO MASATAKA
分类号	C30B25/02;C30B29/42;H01L21/205	主分类号	C30B25/02
代理机构		代理人
主权项
地址

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