| 摘要 |
<p>PURPOSE:To prevent the deformation and deterioration in positional precision of an X-ray shielding pattern from occurring simultaneously enabling the thickness of a protective film to be thinned for augmenting the contrast in X-ray intensity on a substrate to be exposed by a method wherein an X-ray reflecting film is used as a shielding body from X-rays. CONSTITUTION:100-200 pairs of W layers 4 and Be layers 5 comprising one period are laminated to constitute an X-ray reflecting film by these W layers 4 and Be layers 5. Most of X-rays are reflected by the X-ray reflecting film as an X-ray shielding body as well as the X-rays are reflected by the X-ray reflecting film comprising multiple laminated layers of the W layers 4 and the Be layers 5 so that the X-ray absorbing level in a mask may be reduced to restrain the temperature of the mask itself from rising. Furthermore, the levels of photoelectrons and Auger electrons generated in the X-ray shielding body are reduced to lessen the effect of these electrons for exposing the substrate to be exposed near the part below the X-ray shielding body enabling the thickness of a protective film to be thinned. Through these procedures, the change in shape and the deterioration in positional precision of an X-ray shielding pattern are reduced to augment the contrast in the X-ray intensity on the substrate to be exposed.</p> |
