摘要 |
<p>PURPOSE:To prevent the deformation and deterioration in positional precision of an X-ray shielding pattern from occurring simultaneously enabling the thickness of a protective film to be thinned for augmenting the contrast in X-ray intensity on a substrate to be exposed by a method wherein an X-ray absorbing body comprising laminated X-ray reflecting films is used as a shielding body from X-rays. CONSTITUTION:100 pairs of W layers 4 and Be layers 5 comprising one period are laminated lastly depositing the W layer 4 to constitute an X-ray reflecting film and then a W layer 6 is deposited as an X-ray absorbing body on the surface of the last W layer 4. A part of X-rays is reflected by the X-ray reflecting film while the residual X-rays are absorbed into the X-ray absorbing body. Since around half of the X-rays are reflected by the laminated X-ray reflecting film, the temperature of a mask itself is restrained from rising. Furthermore, the levels of photoelectrons and Auger electrons generated in the X-ray shielding body are reduced to lessen the effect of these electrons for exposing the substrate to be exposed near the part below the X-ray shielding body enabling the thickness of a protective film to be made thinner than conventional film. Through these procedures, the change in shape and the deterioration in positional precision of an X-ray shielding pattern are reduced to augment the contrast in the X-ray intensity on the substrate to be exposed.</p> |