发明名称 Multi-rod type magnetron sputtering apparatus
摘要 A glow discharge magnetron sputtering apparatus having an improved multi-rod type target which produces a more uniform and higher rate of deposition on a substrate than obtainable in prior art devices, and which is particularly suitable for use in connection with the deposition of the magnetic materials. The apparatus includes a cathode comprising a cathode body, a backing plate connected removably with the cathode body, a copper-made common plate bonded to the bottom of the backing plate, and a target composed of a plurality of rods of material to be sputtered. Each rod has a sputtering surface of hemisphere form on the apex thereof.
申请公布号 US4879017(A) 申请公布日期 1989.11.07
申请号 US19880279200 申请日期 1988.11.29
申请人 DAE RYUNG VACUMM CO. LTD. 发明人 LEE, HEE-YONG
分类号 C23C14/34;H01J37/34 主分类号 C23C14/34
代理机构 代理人
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