发明名称 RADIATION-SENSITIVE COMPOSITIONS
摘要 <p>RADIATION-SENSITIVE COMPOSITIONS Radiation-sensitive elements, e.g. printing plates, comprising a substrate having coated thereon a photosolubilisable composition comprising an alkalisoluble phenolic resin and an onium salt. The onium salt imparts a solvent resistance to the phenolic resin which is removed upon exposure to radiation thereby providing a solubility differential between exposed and unexposed areas of the composition.</p>
申请公布号 CA1262793(A) 申请公布日期 1989.11.07
申请号 CA19840470287 申请日期 1984.12.17
申请人 MINNESOTA MINING AND MANUFACTURING COMPANY 发明人 NEWMAN, STEPHEN
分类号 G03C5/08;B41C1/10;B41M5/36;G03F7/00;G03F7/004;G03F7/028;G03F7/038;G03F7/039;G03F7/20;(IPC1-7):G03F7/10 主分类号 G03C5/08
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