| 摘要 |
PURPOSE:To obtain a photoresist for fine working having superior characteristics by using alkali-soluble novolak resin formed by condensing m- cresol, p-cresol and phenol mixed in a specified ratio with aldehyde. CONSTITUTION:Alkali-soluble novolak resin is formed by condensing prescribed monomers mixed in a prescribed ratio with aldehyde in the presence of an acid catalyst. The monomers include p-cresol and phenol and are mixed so as to obtain a compsn. within the obliquely lined part of the triangular coordinates with m-cresol, p-cresol and phenol contents as the axes or on the boundary line of the part. Formaldehyde is used as the aldehyde and hydrochloric acid, sulfuric acid, formic acid, oxalic acid or acetic acid as the acid catalyst. A photoresist having superior resolving power, sensitivity, developability and heat resistance is obtd. by using the novolak resin. |
