| 摘要 |
PURPOSE:To enable surface processing in a subsequent process to be carried out easily and also the patterning accuracy by using exposure to light in a photoregist process to be improved without any damage on an area in the periphery of a gap and with the flattening effects of the gap area by covering part of a lower magnetic pole and the gap section using an insulative layer. CONSTITUTION:The area in the periphery of the gap between the entire lower magnetic pole 2 and an upper magnetic pole 7, both of specified size, is formed on a non-magnetic plate 1 of specified thickness using a magnetic material of high magnetic permeability. The positional accuracy of the area in the periphery of the gap is ensured by forming the entire lower magnetic pole 2 and a part of the upper magnetic pole 7 simultaneously. Next, an electrically insulative layer 4 is provided on the magnetic pole and the area in the periphery of the gap leaving a part of the lower magnetic pole 2 intact. Consequently, the area in the periphery of the gap is protected against any possible damage caused by coat lamination processing and coat peel-apart processing in the subsequent process. In addition, accuracy is easily ensured in the subsequent process by flattening of the gap area. After this, an excitation coil 5 is formed on the electrically insulative layer 4, and an insulative layer 6 is formed on the excitation coil 5 on an opposite side to the upper magnetic pole 7. The upper magnetic pole 7 is formed at a position which does not allow overlapping of the lower magnetic pole side on the plane to form a protective layer 8. |
