| 摘要 |
<p>An apparatus and a method for making a reticle mask is disclosed. A reticle mask (15) is made by the double pass method wherein scribe lines (14) are first drawn on the reticle mask (15). Thereafter, a product die pattern (32) is made in the reticle mask (15) by a plurality of times. A plurality of alignment marks (20) are associated with each product die pattern (32). The plurality of alignment marks (20) are well within the scribe line region (14). Thus, any deviation of the relative position of the product die pattern (32) to the scribe line (14) may be quantified.</p> |
