| 摘要 |
PURPOSE:To increase the processing efficiency of a photolithography process, by conveying the exposure-test wafer of a lot to be processed after the preceding lot, giving the exposure-test wafer precedence over the wafers of the preceding lot, and by checking the wafer in addition to its test-exposure and develop- processing. CONSTITUTION:A wafer W1 is conveyed to the third buffer 8, even when a wafer Wa of the preceding lot remains in the buffer 8, by making an operator turn on a exposure test start switch 13, and the wafer W1 is also conveyed to a stepper 9 preferentially as a wafer for exposure-test, then it is test-exposed. When the wafer W1 is carried out of the stepper 9, a exposure-test signal is so attached to the wafer W1 that each following processing device may detect the wafer W1 is a wafer for the exposure test. When the fourth buffer 10 or the fifth buffer 13 has a wafer Wa of the preceding lot, the wafer W1 is also conveyed to a spin developer 14 preferentially, and it is developed and checked. This increases the processing efficiency of photolithography process. |
