| 摘要 |
PURPOSE:To improve heat resistance by incorporating a polymer contg. specified structural units in the principal chain structure and a halide capable of generating radicals under UV and/or far UV. CONSTITUTION:A polymer contg. structural units represented by formula I (where X is O or S) in the principal chain structure and a halide capable of generating radicals under UV and/or far UV are incorporated. The entire principal chain of the polymer may be composed of structural units represented by the formula I or structural units represented by the formula I may coexist with one or more kinds of other structural units in the principal chain. The structural units represented by the formula I in the principal chain may have substituents such as halogen, alkyl and haloalkyl so as to increase sensitivity. Heat resistance can be improved and a high accuracy and high density fine pattern can be formed. |
