| 摘要 |
PURPOSE:To manufacture a composite-type sputtering target capable of easily controlling a compositional ratio by providing a plate-like base target with plural holes having steps formed so that their external shapes are larger at the rear side than at the surface side, respectively, and then inserting chip- shaped targets composed of a material dissimilar to that of the above base target into the above holes, respectively. CONSTITUTION:A plate-like base target 10 (made of transition metals such as Fe and Co) is provided with plural holes 11 having steps formed so that their external shapes are larger at the rear side than at the surface side, respectively. Subsequently, chips 12 formed of a target material (rare earth metals, etc.) dissimilar to the base target 10 material according to the shape of the above holes 11 are inserted into the holes 11 from the rear side of the base target 10. By this method, a composite-type sputtering target 13 in which compositional ratio is easily controlled can be obtained. |
