发明名称 Electrophoretically depositable photosensitive polymer composition
摘要 The invention is directed to a photosensitive polymer composition capable of being electrophoretically depositable as an adherent, uniform photosensitive film on a conductive surface. The photosensitive polymer composition useful for electrodeposition is formed from an aqueous solution or emulsion of at least one polymer having charged carrier groups, a photoinitiator and a source of unsaturation for crosslinking the resulting film upon exposure to actinic radiation. The photosensitive film formed from the photosensitive polymer composition is aqueous developable and resistant to strong inorganic acids and strong bases. The photosensitive polymer composition is useful in the preparation of printed circuit boards, lithographic printing plates, cathode ray tubes, as well as in chemical milling, solder resist and planarizing layer applications.
申请公布号 US4877818(A) 申请公布日期 1989.10.31
申请号 US19880142110 申请日期 1988.01.11
申请人 ROHM AND HAAS COMPANY 发明人 EMMONS, WILLIAM D.;WINKLE, MARK R.
分类号 G03F7/027;G03F7/16 主分类号 G03F7/027
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