首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
METHOD FOR CONTROLLING TENSION IN FURNACE IN CONTINUOUS ANNEALING EQUIPMENT
摘要
申请公布号
JPH01272721(A)
申请公布日期
1989.10.31
申请号
JP19880099533
申请日期
1988.04.22
申请人
MITSUBISHI HEAVY IND LTD
发明人
MONZEN TADAAKI
分类号
C21D9/56;C21D11/00
主分类号
C21D9/56
代理机构
代理人
主权项
地址
您可能感兴趣的专利
ATTENUATOR AND HIGH FREQUENCY DEVICE USING IT
LOW NOISE AMPLIFIER
ELECTRIC CONNECTING BOX
FILTER FOE THROUGH-HOLE, PRINTED WIRING BOARD USING THE SAME, AND MANUFACTURE THEREOF
METALLIC PLATE MATERIAL FOR PRINTED BOARD AND METALLIC BASE PRINTED BOARD
HEAT DISSIPATION STRUCTURE OF SEMICONDUCTOR
SEMICONDUCTOR LIGHT-EMITTING ELEMENT
FORCE DETECTION SENSOR AND MANUFACTURE OF FORCE DETECTION SENSOR
COMPOUND SEMICONDUCTOR EPITAXIAL WAFER
NON-VOLATILE SEMICONDUCTOR MEMORY UNIT AND ITS MANUFACTURE
DEVICE HAVING CASING AND ELECTRONIC PHOTOGRAPH IMAGE FORMING DEVICE
CASING
SEMICONDUCTOR LASER ELEMENT AND MANUFACTURE THEREOF
MANUFACTURE OF SEMICONDUCTOR AND SEMICONDUCTOR DEVICE
SOLID-STATE IMAGE PICKUP DEVICE
LAMINATED SUBSTRATE AND MANUFACTURE THEREOF
BUS STRUCTURE, DATA BASE, AND METHOD OF DESIGNING INTERFACE
SEMICONDUCTOR SUBSTRATE HEATER
HIGH FREQUENCY HEATING DEVICE
AUXILIARY PLUG