| 摘要 |
PURPOSE:To store a developer onto a substrate without using a sealing medium while removing contacts with other members of the developer at the time of development, and to develop the substrate with excellent yield by installing specific spin chuck, development pan, nozzle and moving mechanism. CONSTITUTION:A substrate development processor developing and treating a positive type resist on a substrate 1 has a spin chuck 2 holding the substrate 1 at a horizontal attitude, a development pan 4, which surrounds the outer circumferential section of the substrate 1 held onto the spin chuck 2, is mounted under the state in which there are fine clearances to the periphery of the underside of the substrate 1 and stores a developer on the top face of the substrate 1, a nozzle 3 supplying the upper section of the substrate 1 held onto the spin chuck 2 with the developer, and a moving mechanism relatively moving the development pan 4 and the spin chuck 2 between said state in which there are the fine clearances and the state in which the developer is left onto the substrate 1 by surface tension while separated from the fine clearances. An electric motor 6 is installed to an ascending and descending housing 9 by an air cylinder 8, and the spin chuck 2 is lifted and lowered and shifted. |
