发明名称 MANUFACTURE OF OPTOELECTRONIC OR OPTICAL DEVICE
摘要 PURPOSE: To reduce the cost by coating an etching groove for forming an optical coupling edge partially with a first film of organic material, depositing a second film of organic material on the first film, patterning the second film and then forming a predetermined stripe waveguide pattern through etching by using the patterned second film as a mask. CONSTITUTION: An etching groove 3 made by wet chemical or dry etching and defining the light emission edge (mirror) 2 of a device 10 partially by the vertical side wall thereof is coated with a first photoresist film 5 and the region other than the groove 3 is exposed and developed before being removed. Subsequently, a second photoresist film 6 is deposited on the film 5 and then exposed in a predetermined pattern and developed in order to form an etching mask for a stripe waveguide. Finally, a predetermined stripe waveguide pattern 4 is formed by dry etching or wet chemical etching from a semiconductor plate piece 1 using the mask. According to the method, a low cost fabrication can be realized.
申请公布号 JPH01266782(A) 申请公布日期 1989.10.24
申请号 JP19890053589 申请日期 1989.03.06
申请人 SIEMENS AG 发明人 MARUKUSU MUSHIYUKE
分类号 G02B6/122;G02B6/13;G02B6/136;G02B6/42;H01L27/15;H01L33/00;H01S5/00;H01S5/02;H01S5/026 主分类号 G02B6/122
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