| 摘要 |
<p>Electrochemical process for producing platings of such metals as chromium, nickel and the like, consisting in depositing on the support to be plated at least a first layer of plating metal such as chromium, nickel and the like, by using a current rectifier equipped with an electronic device for the periodic and adjustable reversal of polarity, in such a way as to obtain said first layers with no cracks, then in subsequently depositing on said first layer at least a second layer by using the only positive polarity obtainable from said rectifier, so as to endow said second layer with the required values of hardness and elasticity. Equipment for carrying out such a process, which consists in a generator of double-level pulsating electrical waves, comprising means for independently adjusting the time intervals between two consecutive negative pulses and the duration time and amplitude of the negative waves.</p> |
