发明名称 |
METHOD FOR PATTERNING LAYER HAVING HIGH REFLECTANCE USING PHOTOSENSITIVE MATERIAL |
摘要 |
A method for patterning a layer having a high reflectance includes directly forming on a layer having a high reflectance a light-absorbing film having a ratio of transmitted light intensity to exposing incident light intensity of not more than 30% and forming a photosensitive material film on the light-absorbing film. A selected region of the photosensitive material film is irradiated with the exposing incident light, and the photosensitive material film is developed to form a first pattern. The light-absorbing film is selectively etched using the first pattern as a mask so as to form a second pattern. Finally, the layer having the high reflectance is selectively etched using the second pattern as a mask. |
申请公布号 |
DE3380571(D1) |
申请公布日期 |
1989.10.19 |
申请号 |
DE19833380571 |
申请日期 |
1983.07.05 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
UENO, TSUNEHISA;KAMATA, YUTAKA;MIYAZAKI, SINJI |
分类号 |
G03F7/09;H01L21/027;H01L21/30;H01L21/312;H01L21/3213;(IPC1-7):G03F7/02 |
主分类号 |
G03F7/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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