发明名称 |
System for manufacturing semiconductors under clean condition. |
摘要 |
<p>In semiconductor production plants a highly clean state is required. In a plant building, through which air is forcibly circulated, a clean room (12) in a low or medium cleanliness state is formed using a filter (17). A plurality of processing units are provided in the clean room (12) and held in a high cleanliness state. A transport robot (23) transfers a workpiece or like object to and from each processing unit. The robot (23) is capable of being driven to positions corresponding to the processing units and hoods the workpiece or object in a highly clean state. Thus, there is no need of holding the entire building highly clean, and only a required part of the building may be held in a highly clean state, which is advantageous from the standpoint of cost.</p> |
申请公布号 |
EP0335752(A2) |
申请公布日期 |
1989.10.04 |
申请号 |
EP19890400122 |
申请日期 |
1989.01.16 |
申请人 |
KABUSHIKI KAISHA N.M.B. SEMICONDUCTOR |
发明人 |
TAMURA, TAKUMI;SHINODA, SHOSUKE;OKASHITA, KYOHIKO;YAMASHITA, TETSUO |
分类号 |
B23Q41/00;B25J19/00;B25J21/00;F24F7/06;H01L21/00;H01L21/02;H01L21/304;H01L21/677 |
主分类号 |
B23Q41/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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