| 摘要 |
<p>PURPOSE:To manufacture a retricle which is compatible with a reticle manufactured by a reducing camera by correcting the coordinate values of pattern data for an optical reticle drawing device previously according to the lens distortion of the reducing camera. CONSTITUTION:The pattern data to be supplied to the optical reticle drawing device which manufactures the reticle is divided into rectangular units of <=100mum before reticle drawing. Then the coordinates of the rectangles are corrected, one by one, by using data on the lens distortion of the reducing camera which is measured in advance. The pattern data which is generated as mentioned above is drawn by using the optical reticle drawing device to obtain an exposure pattern. The drawn pattern has the same distortion with the optical system of the reducing camera, so the pattern is compatible with the reticle manufactured by the reducing camera.</p> |
