HEAT-TREATED CHEMICAL VAPOR DEPOSITION SUBSTRATE AND HEAT-TREATMENT METHOD

摘要

A method for heat treating a coated substrate is described wherein the outer coating on the substrate is comprised of a chemically vapor deposited mixture of tungsten and tungsten carbide. The coated substrate is heated to the deposition temperature or not substantially above the deposition temperature in a non-reactive atmosphere. The heat treating temperature is sufficient to confer a desired improvement in erosive and abrasive wear resistance in the outer coating but does not result in substantial degradation of the mechanical properties of the substrate or in formation of undeisrable inter-metallic layers.